7.9 Pplus

Pplus RULES

RULE NO.	DESCRIPTION	LAYOUT RULE
Layer	PP = Nplus Implant
PP.1	Width	0.4
PP.2	Space	0.4
PP.3a	Space to NCOMP for NCOMP (1) inside LVPWELL (2) outside NWELL and DNWELL	0.16
PP.3b	Space to NCOMP: For Inside DNWELL. I) NCOMP space to LVPWELL >= 0.43μm II) NCOMP space to LVPWELL< 0.43μm	0.08 0.16
PP.3c	Space to NCOMP: For Outside DNWELL, inside Nwell: I) NWELL Overlap of NCOMP >= 0.43μm II) NWELL Overlap of NCOMP < 0.43μm	0.08 0.16
PP.3d	Min/max space to a butted NCOMP	0
PP.3e	Space to NCOMP edge adjacent to a butting edge	0
PP.4a	Space related to N-channel gate at a butting edge parallel to gate	0.32
PP.4b	Within 0.32μm of channel, space to N-channel gate extension perpendicular to the direction of Poly2	0.22
PP.5a	Overlap of P-channel gate	0.23
PP.5b	Extension beyond COMP for COMP (1) Inside NWELL (2) outside LVPWELL but inside DNWELL.	0.16
PP.5c	Extension beyond COMP: For Inside DNWELL, inside LVPWELL: I) For LVPWELL overlap of Pplus >= 0.43μm for LVPWELL tap II) For LVPWELL overlap of Pplus < 0.43um for the LVPWELL tap	0.02 0.16
PP.5d	Extension beyond COMP: For Outside DNWELL I) For Pplus to NWELL space >= 0.43μm for Pfield or LVPWELL tap II) For Pplus to NWELL space < 0.43μm for Pfield or LVPWELL tap	0.02 0.16
PP.6	Overlap with PCOMP butted to NCOMP	0.22
PP.7	Space to unrelated unsalicided Poly2	0.18
PP.8a	Minimum Pplus area	0.35 μm2
PP.8b	Minimum area enclosed by Pplus	0.35 μm2
PP.9	Overlap of unsalicided Poly2	0.18
PP.10	Overlap of unsalicided COMP	0.18
PP.11	Butting Pplus and NCOMP is forbidden within 0.43μm of Nwell edge (for outside DNWELL) and of LVPWELL edge (for inside DNWELL case).
PP.12	Overlap with N-channel Poly2 gate extension is forbidden within 0.32μm of N-channel gate